Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films
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Formation of Nickel Silicide from Direct-Liquid-Injection Chemical-Vapor-Deposited Nickel Nitride Films Zhefeng Li, Roy G. Gordon,* Huazhi Li, Deo V. Shenai, and Christian Lavoie Department of Chemistry and Chemical Biology, Harvard University, Cambridge, Massachusetts 02138, USA Dow Electronic Materials, North Andover, Massachusetts 01845, USA IBM, Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA
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Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Reduction to Nickel Films
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تاریخ انتشار 2010